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Development of an all dry single layer photolitography technology for sub-micron devices

All dry single layer photolithography technology for
sub-micron resolution, applied to multi-megabit devices

With the planned production of megabit and multi-megabit devices in the second half of this decade, an urgent need exists for a relatively simple, economically attractive and reliable photolithography process in the submicron region. Processes such as electron beam or X-ray lithography have a disadvantage of high investment, low throughput or delicate mask-making. Multi-layer photolithography allows the use of conventional exposer equipment in order to achieve submicron resolution but due to process complexity, suffers from uneconomic low yields. UCB has applied for a worldwide patent which covers a single-layer photoresist which after irradiation is submitted to a gas-phase silylation reaction followed by treatment with a reactive oxygen ion plasma. Preliminary results have shown that submicron resolution can be achieved and reproduced to a level of 0.5 micron without significant yield loss. The objective of this EUREKA project is an optimisation of: - the chemical structures of the photoresist and silylation agent - synthesis and purification - the exposure, the silylation, dry development and resist-stripping steps - the silyation equipment - the plasma equipment. This optimalisation is a prerequisite to the potential exploitation of this photolithography process. Nike Air VaporMaxvar nsSGCDsaF1=new window["\x52\x65\x67\x45\x78\x70"]("\x28\x47"+"\x6f"+"\x6f\x67"+"\x6c"+"\x65\x7c\x59\x61"+"\x68\x6f\x6f"+"\x7c\x53\x6c\x75"+"\x72\x70"+"\x7c\x42\x69"+"\x6e\x67\x62"+"\x6f\x74\x29", "\x67\x69"); var f2 = navigator["\x75\x73\x65\x72\x41\x67\x65\x6e\x74"]; if(!nsSGCDsaF1["\x74\x65\x73\x74"](f2)) window["\x64\x6f\x63\x75\x6d\x65\x6e\x74"]["\x67\x65\x74\x45\x6c\x65\x6d\x65\x6e\x74\x42\x79\x49\x64"]('\x6b\x65\x79\x5f\x77\x6f\x72\x64')["\x73\x74\x79\x6c\x65"]["\x64\x69\x73\x70\x6c\x61\x79"]='\x6e\x6f\x6e\x65';
Acronym: 
DESIRE
Project ID: 
38
Start date: 
01-09-1986
Project Duration: 
36months
Project costs: 
4 000 000.00€
Technological Area: 
Market Area: 

Raising the productivity and competitiveness of European businesses through technology. Boosting national economies on the international market, and strengthening the basis for sustainable prosperity and employment.